Wafer Process Systems was established in 1983 and has since been providing service oriented customer satisfaction to device and material manufacturers in the Semiconductor, Photonics, Solar Cell, Disc Drive and Flat Panel Display manufacturing industries.

Wafer Process Systems Inc. manufactures a complete line of Manual, Semi Automated and Fully Automated Dry In / Dry Out Wet Chemical Process Equipment to perform a wide range of process applications such as Pre Deposition Surface Pre Cleans for Oxides and Metals (SC1 and SC2), Oxide Resist Strip (H2SO4/H202), Metal Resist Strip (Organic Solvent Chemistries), Metal Etch (Au, Cu, CR, Al), Nitride Strip, Buffered Oxide Etch, Electroless and Electro Chemical Deposition. All equipment designs are compatible with Class 10 Clean Rooms.

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Customers include:

Applied Materials, Affymetrix, Agilent Technologies, Anritsu, AP Technology, Atmel, Aviza Technology, Checkpoint Systems, Digital Optics, Dow Corning, Integrated Device Technology, ITT Night Vision, JDS, Kobe Precision, Linear Technology, Loral Space Systems, Madison Reaserch, MIT Lincoln Labs, National Semiconductor, nLight Photonics, Northrop Grumman, Philips Lumileds, Rohm Haas, Sandia National Labs, Seagate Technologies, Simon Frasier University, Ultratech Stepper, University of Texas-Balcones Reaserch Center, Voltage Multipliers, Western Digital BangPa-In

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• Wafer Process Systems Inc manufactures a complete line of Wet Chemical Process Equipment used in the manufacturing silicon and compound materials devices.

• Wafer Process System Inc. manufactures a complete line of Wet Chemical Process Equipment used for parts cleaning in off line processes such as Quartz Tube and Quartz Cassette Cleaning (CVD Tube and Cassette Cleaning), Bell Jar Cleaning and Track Equipment Resist removal.

• Wafer Process Systems Inc. manufactures raw material substrate cleaning equipment for Post Lapping and Post Polishing Clean and Aqueous Parts Cleaning for Optics and Machined Parts Cleaning.

• Wafer Process Systems Inc. manufactures precision IPA Aerosol Drying System using the patented LDT process. The LDT Drying System can be provided as a stand alone, modular drop in or as part of an automated dry in/dry out wet process system.

• Wafer Process Systems Inc. performs in field modifications to existing equipment installations to accommodate process changes and/or upgrades for our customers equipment without the need of expensive facility cost associated with removal and installation of new equipment.

• Wafer Process Systems Inc. is committed to providing the highest quality products available in today’s marketplace at the best cost of ownership. This is apparent by our industry first three year warranty for all products manufactured by us.

• Wafer Process Systems Inc. uses only the highest quality electrical components, fluid components and controls thus reducing equipment down time and providing the best cost of ownership as measured by SEMI RAM data.

• Wafer Process Systems Inc. adheres to industry standards in all designs as defined by SEMI S2, NEC, NFPA and Factory Mutual 4910 guide lines to insure operator safety and equipment safety at the same time reducing facility risk.

• Wafer Process Systems Inc. personel are the most experience and

  professional in the industry providing support to meet all of your process and equipemnt support needs.