Acid-Base Semiconductor Wet Benches
Wafer Process Systems Inc. performs in field modifications to existing equipment to accommodate process changes and/or safety and upgrades for our customers existing equipment without the need of extensive cost associated with the removal of existing equipment and installation of new equipment, including our acid-base semiconductor wet bench.
Acid-Base Semiconductor Wet Bench Overview
The Wafer Process Systems Inc. Model WPS-VLF-800-FA-FM-PVC-C, Factory Mutual Approved Noveon PVC-C Vertical Laminar Flow Front Access Wet Process System is designed to process Si and GaAs wafers in a class 10 environments. Systems are constructed out of FM approved CPVC, PVC-C, (PVDF) Kynar or (ECTFE) Halar construction for corrosion resistance to acids and bases. Modular recess deck with 360° process vessel lip exhaust and secondary exhaust ensures proper fume capture and reduces facility exhaust requirements. The through wall installation permits all service connections to be made in rear chase and facilitates auxiliary equipment installations. Open base provides for clean room air return and reduces particle build up beneath system. Safety and ergonomics are main aspects in the system design. Seismic bracing at six points insures additional safety to facility and personnel. All DI Water fluid components are accessible through removable front access panels. All electrical components are accessible through front slide out control panels and incorporate interlock switches with EPO interface for safety. All chemical wetted components are PVDF, PFA or Quartz.
Through Wall Installation in Class 10 Clean Room at Customers Facility
Recessed Deck with 360° Process Vessel Lip Exhaust and Secondary
Exhaust Slots for Complete Fume Capture
SECONDARY EXHAUST SLOTS