Wafer Process Systems Inc. offers automated aqueous cleaning systems for critical cleaning and sterilization of biomedical components and implant devices. Processes incorporate Megasonic Cleaning Technologies using Aqueous Solutions and includes a final drying process using the patented Liquid Diffusion Technology IPA Aerosol Drying Process for particle neutral residue free drying.
Wafer Process Systems Inc. Model MEG-QDR-LDT Series, Automated Aqueous Cleaning System
Clean your final products using the proven processes of Sub-Micron Particulate Removal with Megasonic Acoustic Streaming Cleaning Technology using aqueous solutions to remove organic contamination and particulate with ultra-pure DI water rinsing and Liquid Diffusion Technology IPA Aerosol Drying Technology all performed in a single chamber. Up to four different chemistries can be used in sequence to perform various steps in rescaling, cleaning and sterilization. Chemical removal is performed by DI Water Rinsing with the Final Drying and sterilization process.
Wafer Process Systems Inc. Model MEG-QDR-LDT Series, Automated Aqueous Cleaning System provides enhanced cleaning and drying performance for a variety of material surfaces. This proprietary tool design and its subsystems control critical process parameters from recirculation and filtration of cleaning chemistries, final DI water rinsing and the creation of an ultra-pure IPA aerosol layer that moves across a motionless part to diffusively remove water, without leaving watermarks. The Venturi IPA Aerosol Generator and its subsystem very efficiently creates the ultra-pure IPA aerosol layer with the robust process flexibility necessary to dry high aspect ratio / deep trench topography, half-pitch wafer spacing, and a wide variety of other applications. This subsystem uses no energy to passively create a unique range of IPA aerosols that other IPA dryers simply cannot create. Furthermore, using an IPA aerosol in itself eliminates the safety hazard of IPA vapor dryers.
The operator interface is via a colored touch screen panel which provides full graphical display of all process parameters. The touch screen controls incorporate an operation, maintenance and alarm status screens. The operation screen provides full system status during operation and in the event of any parameters not being met an alarm screen will prompt the operator in the event of any alarm conditions. The maintenance screen panel allows service technicians the ability to control all functions manually and to calibrate temperature indicators and auto tune all PID software functions. The integral database provides the ability to create multiple recipes and download from process recipe select screen.
Standard Features Include:
Single Chemical Process Configuration with Rinsing and Drying.
All systems are guaranteed for three years and provide a 98% uptime.
All systems electrical components are UL, CSA or CE listed.
Enclosure constucted of flame retardand C-PVC to meet Factory Mutual 4910 Clean Room Materials Flammability Test Protocol.
Fluoropolymer constructed process chamber with all wetted components constructed out of ECTFE, PFA Teflon, PTFE Teflon.
Fluoropolymer constructed process chemical reserviors. Reservoirs are remoted directly behind process tool in service chase to reduce cleanroom usage.
To maintain process purity all fluids are constantly recirculated and filtered, all process gases are filtered to .003 micron absolute, all process chemistries are filtered to .2 micron absolute and DI Water is filtered to .2 micron absolute.
Megasonic Acoustic Streaming Cleaning Technology for enhanced cleaning of organics and sub-micron particulates.
Option Features Include:
Microprocessor based Graphical User Interface with real time data acquisition and control.
Multiple Chemical Process Configuration (Up to 4 Separate Chemicals) with Rinsing and Drying.
Enclosure constructed of 304 stianless steel or 316 mirror finished stainless steel.
Electropolished 316L stainless steel process chamber, chemcial reserviors and chemical process fluid components.
CO2 flame suppresion system with dual mode UV/IR flame detectors.
HEPA or ULPA vertical laminar flow air filtration with fully enclosed mini environment.
SECS/GEMS Protocol interface.
Hot DI Water Rinsing.
Vacuum Assited Drying.
Contact Wafer Process Systems Inc. for all your aqueous cleaning and wet process equipment needs today.